Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles

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Coxon, Paul R., Ashby, Shane P., Frogley, Mark D. and Chao, Yimin ORCID: https://orcid.org/0000-0002-8488-2690 (2012) Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles. Journal of Physics D: Applied Physics, 45 (35). ISSN 0022-3727

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Item Type: Article
Faculty \ School: Faculty of Science > School of Chemistry
UEA Research Groups: Faculty of Science > Research Groups > Physical and Analytical Chemistry (former - to 2017)
Faculty of Science > Research Groups > Chemistry of Materials and Catalysis
Faculty of Science > Research Groups > Energy Materials Laboratory
Depositing User: Users 2731 not found.
Date Deposited: 08 Jan 2013 12:48
Last Modified: 23 Oct 2022 00:15
URI: https://ueaeprints.uea.ac.uk/id/eprint/40714
DOI: 10.1088/0022-3727/45/35/355303

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