Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles

Coxon, Paul R., Ashby, Shane P., Frogley, Mark D. and Chao, Yimin ORCID: https://orcid.org/0000-0002-8488-2690 (2012) Thermal evaporation and x-ray photostability of dodecyl-passivated silicon nanoparticles. Journal of Physics D: Applied Physics, 45 (35). ISSN 0022-3727

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Item Type:	Article
Faculty \ School:	Faculty of Science > School of Chemistry (former - to 2024)
UEA Research Groups:	Faculty of Science > Research Groups > Physical and Analytical Chemistry (former - to 2017) Faculty of Science > Research Groups > Chemistry of Materials and Catalysis Faculty of Science > Research Groups > Energy Materials Laboratory
Depositing User:	Users 2731 not found.
Date Deposited:	08 Jan 2013 12:48
Last Modified:	24 Sep 2024 08:53
URI:	https://ueaeprints.uea.ac.uk/id/eprint/40714
DOI:	10.1088/0022-3727/45/35/355303

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