Gold film with gold nitride - A conductor but harder than gold

Siller, L., Peltekis, N., Krishnamurthy, S., Chao, Y. ORCID: https://orcid.org/0000-0002-8488-2690, Bull, S. J. and Hunt, M. R. C. (2005) Gold film with gold nitride - A conductor but harder than gold. Applied Physics Letters, 86 (22). ISSN 0003-6951

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Abstract

The formation of surface nitrides on gold films is a particularly attractive proposition, addressing the need to produce harder, but still conductive, gold coatings which reduce wear but avoid the pollution associated with conventional additives. Here we report production of large area gold nitride films on silicon substrates, using reactive ion sputtering and plasma etching, without the need for ultrahigh vacuum. Nanoindentation data show that gold nitride films have a hardness similar to 50% greater than that of pure gold. These results are important for large-scale applications of gold nitride in coatings and electronics. (c) 2005 American Institute of Physics.

Item Type:	Article
Faculty \ School:	Faculty of Science > School of Chemistry
Depositing User:	Rachel Smith
Date Deposited:	09 May 2011 15:47
Last Modified:	24 Oct 2022 02:27
URI:	https://ueaeprints.uea.ac.uk/id/eprint/30069
DOI:	10.1063/1.1941471

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